SPIE Advanced Lithography 2024
SPIE Advanced Lithography 2024
25 – 29 February 2024. SPIE 2024, San Jose, USA
The IMS will be represented with a poster at the SPIE Advanced Lithography 2024 in San Jose, USA.
Conference Presentation
Wednesday, February 28, 2024, 5:30 pm – 7:00 pm
“Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides“
M. Greul1, K. Edelmann1, E. Linn2, F. Weißenborn 2, J. Hartbaum1, I. Stolberg2, S. Fasold2, U. Weidenmueller2
1 Institut für Mikroelektronik Stuttgart (IMS CHIPS), Stuttgart, Germany
2 Vistec Electron Beam GmbH, Jena
For more information on the SPIE Advanced Lithography 2024, please visit the following website: https://spie.org/conferences-and-exhibitions